Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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Note that the unit in the SHOT command is in 0. | Note that the unit in the SHOT command is in 0.25nm, i.e. 'SHOT A,16' gives a shot pitch of 4nm. | ||
If the next user of the machine has loaded a cassette in slot #10 and you wish to load that cassette after exposure, you can finalize the sdf-file with 'END 10'. | If the next user of the machine has loaded a cassette in slot #10 and you wish to load that cassette after exposure, you can finalize the sdf-file with 'END 10'. | ||