Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions
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The RCA clean is used for cleaning wafers before taking them into the furnaces and a few other equipments (check the cross contamination sheet). | The RCA clean is used for cleaning wafers before taking them into the furnaces and a few other equipments (check the cross contamination sheet). Aa mentioned above a crucial part of the RCA cleaning procedure is the oxidation by H<sub>2</sub>O<sub>2</sub> at elevated temperatures. Therefore, the lifetime of RCA1 and RCA2 solutions after preparation is limited because H<sub>2</sub>O<sub>2</sub> decomposes at 70<sup>o</sup>C. | ||
*RCA1 contains: H<sub>2</sub>O, NH<sub>4</sub>OH and H<sub>2</sub>O<sub>2</sub> (5:1:1). It is used for removal of light organics, particles and metals.<br> | *RCA1 contains: H<sub>2</sub>O, NH<sub>4</sub>OH and H<sub>2</sub>O<sub>2</sub> (5:1:1). It is used for removal of light organics, particles and metals.<br> | ||