Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD-4: Difference between revisions

Revision as of 11:35, 27 June 2017

**Process runs**
Date	Substrate Information				Process Information				SEM Images
Date	Wafer info	Mask	Material/ Exposed area	Tool / Operator	Conditioning	Recipe	Wafer ID	Comments	SEM Images
8/1-2015	4" Wafer with travkaXX mask	AZ standard	Si / XX %	Pegasus/jmli	s004781	danchip/jml/showerhead/prD/PrD-4, 150 cyc or 8:00 mins	S004782	New showerhead

Revision as of 11:34, 27 June 2017 view source Jmli (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,400 edits No edit summary ← Older edit		Revision as of 11:35, 27 June 2017 view source Jmli (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,400 edits No edit summary Newer edit →
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	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"