Specific Process Knowledge/Characterization/Profiler: Difference between revisions
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<!-- give the link to the equipment info page in LabManager: --> | <!-- give the link to the equipment info page in LabManager: --> | ||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=123 Dektak 8 in LabManager] | [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=123 Dektak 8 in LabManager] | ||
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!style="background:silver; color:black;" align="left"|Purpose | !style="background:silver; color:black;" align="left"|Purpose | ||
|style="background:LightGrey; color:black"|Profiler for measuring micro structures.||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Profiler for measuring micro structures.||style="background:WhiteSmoke; color:black"| | ||
*Single | *Single line profiles | ||
*Wafer mapping | *Wafer mapping | ||
*[[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] by measuring wafer bow | *[[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] by measuring wafer bow | ||
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!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Performance | !style="background:silver; color:black" align="left" rowspan="5" valign="top" |Performance | ||
|style="background:LightGrey; color:black"|Scan range | |style="background:LightGrey; color:black"|Scan range x y||style="background:WhiteSmoke; color:black"| | ||
Line scan x: 50 µm to 100 mm | Line scan x: 50 µm to 100 mm | ||
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50 Å to 1 mm | 50 Å to 1 mm | ||
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|style="background:LightGrey; color:black"|Resolution | |style="background:LightGrey; color:black"|Resolution x y | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Down to 0.067 µm | |||
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|style="background:LightGrey; color:black"|Resolution z | |style="background:LightGrey; color:black"|Resolution z | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
1 Å, 10 Å, 4 0Å or 160 Å (for ranges 65 kÅ, 655 kÅ, 2620 kÅ and 1 mm respectively) | |||
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|style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W | |style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
1.2(W[µm]-5µm) | 1.2*(W[µm]-5µm) | ||
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|style="background:LightGrey; color:black"|Tip radius | |style="background:LightGrey; color:black"|Tip radius | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*5 µm 45<sup>o</sup> cone | *5 µm, 45<sup>o</sup> cone | ||
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!style="background:silver; color:black" align="left" rowspan="2" valign="top" |Performance | !style="background:silver; color:black" align="left" rowspan="2" valign="top" |Performance | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *Up to 8" | ||
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| style="background:LightGrey; color:black"|Substrate material allowed | | style="background:LightGrey; color:black"|Substrate material allowed | ||