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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions

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It is also possible to deposit silicon nitride using the Lesker sputter system.  
It is also possible to deposit silicon nitride using the Lesker sputter system.  


*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride/Deposition of stoichiometric nitride using the 4" LPCVD nitride furnace|Deposition of stoichimetric nitride using the 4" LPCVD nitride furnace]]
*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride/Deposition of stoichiometric nitride using the 4" LPCVD nitride furnace|Deposition of stochiometric nitride using the 4" LPCVD nitride furnace]]
*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride/Deposition of low stress nitride using the 6" LPCVD nitride furnace|Deposition of silicon rich (low stress) nitride using the 6" LPCVD nitride furnace]]
*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride/Deposition of low stress nitride using the 6" LPCVD nitride furnace|Deposition of silicon rich (low stress) nitride using the 6" LPCVD nitride furnace]]


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