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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions

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Deposition of silicon nitride can be done with either LPCVD (Low Pressure Chemical Vapor Deposition) or PECVD (Plasma Enhanced Chemical Vapor Deposition). Stochiometric nitride or silicon rich (low stress) LPCVD nitride is deposited on a batch of wafers in a LPCVD nitride furnace, and PECVD nitride (or oxynitride) is deposited on a few samples at a time in a PECVD system. LPCVD nitride has a good step coverage and a very good uniformity. Using PECVD it is possible to deposit a much lower temperature and a thicker layer of nitride on different types of samples, but the nitride does not cover sidewalls very well.
Deposition of silicon nitride can be done with either LPCVD (Low Pressure Chemical Vapor Deposition) or PECVD (Plasma Enhanced Chemical Vapor Deposition). Stochiometric nitride or silicon rich (low stress) LPCVD nitride is deposited on a batch of wafers in a LPCVD nitride furnace, and PECVD nitride (or oxynitride) is deposited on a few samples at a time in a PECVD system. LPCVD nitride has a good step coverage and a very good uniformity. Using PECVD it is possible to deposit a much lower temperature and a thicker layer of nitride on different types of samples, but the nitride does not cover sidewalls very well.


It is also possible to deposit silicon nitride using the Lesker sputter system. However, the process hasnot been tested yet, but the required sputter targets for nitride deposition are avaliable.  
It is also possible to deposit silicon nitride using the Lesker sputter system. However, the process has not been tested yet, but the required sputter targets for nitride deposition are avaliable.  


*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride/Deposition of stoichiometric nitride using the 4" LPCVD nitride furnace|Deposition of stoichimetric nitride using the 4" LPCVD nitride furnace]]
*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride/Deposition of stoichiometric nitride using the 4" LPCVD nitride furnace|Deposition of stoichimetric nitride using the 4" LPCVD nitride furnace]]
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