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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions

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!Stoichiometry
!Stoichiometry
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*Si<sub>3</sub>N<sub>4</sub>
*Stoichiometric nitride, Si<sub>3</sub>N<sub>4</sub>
*SRN (only 4" nitride furnace)
*Low stress/silicon rich nitride, SRN
Si<sub>3</sub>N<sub>4</sub>: Stoichiometric nitride
 
SRN: Silicon rich (low stress) nitride
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*Si<sub>x</sub>N<sub>y</sub>H<sub>z</sub>
*Si<sub>x</sub>N<sub>y</sub>H<sub>z</sub>
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*1-25 100 mm wafers
*1-25 100 mm wafers
*1-25 150 mm wafers (only 6" furnace)  
*1-25 150 mm wafers (only 6" furnace)  
Depending on what furnace you use
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*Several smaller samples
*Several smaller samples
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