Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By BGHE: Difference between revisions
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|<!--'''T'''--> 0 | |<!--'''T'''--> 0 | ||
|<!--'''Process time'''--> 8 min | |<!--'''Process time'''--> 8 min | ||
|width="200"|<!--'''Comment'''--> One of the good ones. the mask is well preserved, CF barc etch | |width="200"|<!--'''Comment'''--> One of the good ones. the mask is well preserved, CF barc etch. The small pitch line are etched much slower that the higher pitch lines | ||
|width="200"|<!--'''Results'''--> | |width="200"|<!--'''Results'''--> | ||
[[File: ICP metal s007593_25.jpg|100px|frameless]] [[File:ICP metal s007593_28.jpg|100px|frameless]] | [[File: ICP metal s007593_25.jpg|100px|frameless]] [[File:ICP metal s007593_28.jpg|100px|frameless]] | ||