Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By BGHE: Difference between revisions
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|width="200"|<!--'''Comment'''--> One of the good ones. the mask is well preserved, CF barc etch | |width="200"|<!--'''Comment'''--> One of the good ones. the mask is well preserved, CF barc etch | ||
|width="200"|<!--'''Results'''--> | |width="200"|<!--'''Results'''--> | ||
[[File:s007679_01.jpg|100px|frameless]] [[File:s007679_04.jpg|100px|frameless]] | [[File: ICP metal s007679_01.jpg|100px|frameless]] [[File:ICP metal s007679_04.jpg|100px|frameless]] | ||
|<!--'''CD change (mask 55% trench) after s007467 is it <50% after barc etch'''<br> | |<!--'''CD change (mask 55% trench) after s007467 is it <50% after barc etch'''<br> | ||
trench opening as a fraction of pitch--> | trench opening as a fraction of pitch--> | ||