Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By BGHE: Difference between revisions
| Line 73: | Line 73: | ||
|<!--'''T'''--> 0 | |<!--'''T'''--> 0 | ||
|<!--'''Process time'''--> 7 min | |<!--'''Process time'''--> 7 min | ||
|width="200"|<!--'''Comment'''--> | |width="200"|<!--'''Comment'''--> One of the good ones. the mask is well preserved | ||
|width="200"|<!--'''Results'''--> | |width="200"|<!--'''Results'''--> | ||
[[File:s007785_05.jpg|100px|frameless]] [[File:s007785_08.jpg|100px|frameless]] | [[File:s007785_05.jpg|100px|frameless]] [[File:s007785_08.jpg|100px|frameless]] | ||