Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By BGHE: Difference between revisions
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! '''Process time''' | ! '''Process time''' | ||
! '''Comment''' | ! '''Comment''' | ||
! width=" | ! width="400"|'''Results''' | ||
! '''CD change (mask 55% trench) after s007467 is it <50% after barc etch'''<br> | ! '''CD change (mask 55% trench) after s007467 is it <50% after barc etch'''<br> | ||
trench opening as a fraction of pitch | trench opening as a fraction of pitch | ||