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Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Line 54: Line 54:
*O<sub>2</sub>: 0-100 sccm
*O<sub>2</sub>: 0-100 sccm
*C<sub>4</sub>F<sub>8</sub>: 0-300 sccm
*C<sub>4</sub>F<sub>8</sub>: 0-300 sccm
*CO<sub>2</sub>: 0-100 sccm
*Ar: 0-100 sccm
*Ar: 0-100 sccm
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