Specific Process Knowledge/Thin film deposition/Deposition of Gold: Difference between revisions

Revision as of 12:45, 13 June 2017 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits →Thin Au layer deposition using Lesker ← Older edit		Revision as of 12:55, 13 June 2017 view source Rmal (talk \| contribs) NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231, fotonik 9 edits No edit summary Newer edit →
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	''NOTE: After depositing 10 layers of 10nm each, one on top of each other, the roughness increased to 0.8nm RMS''		''NOTE: After depositing 10 layers of 10nm each, one on top of each other, the roughness increased to 0.8nm RMS''

	Work done by Johneph Sukham (~~[mailto:johsu~~@~~fotonik.dtu.dk?Subject=Thin%20Au%20deposition%20using%20Lesker click to email]~~) and Radu Malureanu (~~[mailto:rmal~~@~~dtu~~.~~dk?Subject=Thin%20Au%20deposition%20using%20Lesker click to email])~~		Work done by Johneph Sukham (@ DTU Fotonik) and Radu Malureanu (@ DTU Fotonik and DTU Danchip) in 2016-2017.