Specific Process Knowledge/Thin film deposition/Deposition of Gold: Difference between revisions

Revision as of 10:56, 13 June 2017 view source Rmal (talk \| contribs) NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231, fotonik 9 edits No edit summary ← Older edit		Revision as of 10:57, 13 June 2017 view source Rmal (talk \| contribs) NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231, fotonik 9 edits No edit summary Newer edit →
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	''NOTE: After depositing 10layers of 10nm each, the roughness increased to 0.8nm RMS''		''NOTE: After depositing 10layers of 10nm each, the roughness increased to 0.8nm RMS''

	Work done by Johneph Sukham ([mailto:johsu@fotonik.dtu.dk?Subject=Thin ~~Au deposition using Lesker~~ click to email]) and Radu Malureanu ([mailto:rmal@dtu.dk?Subject=Thin ~~Au deposition using Lesker~~ click to email])		Work done by Johneph Sukham ([mailto:johsu@fotonik.dtu.dk?Subject=Thin%20Au%20deposition%20using%20Lesker click to email]) and Radu Malureanu ([mailto:rmal@dtu.dk?Subject=Thin%20Au%20deposition%20using%20Lesker click to email])