Specific Process Knowledge/Etch/Wet Aluminium Etch: Difference between revisions
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'''Feedback to this page''': '''[mailto: | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Wet_Aluminium_Etch click here]''' | ||
[[Category: Equipment|Etch Wet Aluminium Etch]] | [[Category: Equipment|Etch Wet Aluminium Etch]] | ||
[[Category: Etch (Wet) bath|Aluminium]] | [[Category: Etch (Wet) bath|Aluminium]] | ||
Ething of Aluminium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions. | Ething of Aluminium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions. | ||
=Wet Aluminium Etch= | =Wet Aluminium Etch= | ||