Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions
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Temp: 80<sup>o</sup>C<br> | Temp: 80<sup>o</sup>C<br> | ||
Time: 5 min | Time: 5 min | ||
|You can use the 'Mask Clean' bath in Wet Bench 04 (in cleanroom D-3). <b>However, this requires planning at least a couple of days in advance, since the bath is primarily used for other purposes!</b> | |You can use the 'Mask Clean' bath in Wet Bench 04 (in cleanroom D-3). <b>However, this requires planning at least a couple of days in advance, since the bath is primarily used for other purposes!</b> Alternatively use a very clean glass beaker. The recommended procedure is: | ||
*Pour H<sub>2</sub>SO<sub>4</sub> into bath/beaker | *Pour H<sub>2</sub>SO<sub>4</sub> into bath/beaker | ||
*Place wafers in clean carrier (USE this in steps 2-7) | *Place wafers in clean carrier (USE this in steps 2-7) | ||