Specific Process Knowledge/Lithography/NanoImprintLithography: Difference between revisions

Revision as of 10:28, 19 May 2017

Imprinter 01

Feedback to this section: Imprinter 01 click here

The Imprinter 01 is a system for imprinting in polymers. 2 different types of imprinting can be done: Hot embossing and flash imprint. It is not possible to align the wafers one wishes to imprint (except by eye).

The user manual, user APV, and contact information can be found in LabManager

Imprint information

Imprinting

Overview of the performance of the Imprinter 01 and some process related parameters

Purpose		Imprinting
Performance	Alignment accuracy	Only by eye
Process parameter range	Process Temperature	Room temperature to 200°C
	Process pressure	~5Failed to parse (SVG (MathML can be enabled via browser plugin): Invalid response ("Math extension cannot connect to Restbase.") from server "https://wikimedia.org/api/rest_v1/":): {\displaystyle \cdot} 1mbar - atm
	Imprint Pressure	0-6 bar
Substrates	Batch size	Pieces to 4" wafers
	Substrate material allowed	Silicon Quartz Pyrex
	Material allowed on the substrate	Silicon oxide Silicon (oxy)nitride Poly Silicon Photoresist PMMA TOPAS SU-8 Metals: Au, Sn, Ag, Al, Ti.

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 '''[mailto:labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/NanoImprintLithography# Imprinter 01 click here]'''
-[[Image:imprinterfig1.jpg|300x300px|thumb|Wet Poly Etch: Positioned in cleanroom D-3 to the left in the bench]]
+[[Image:imprinterfig1.jpg|300x300px|thumb|Imprinter 01: Positioned in cleanroom A-5]]
 The Imprinter 01 is a system for imprinting in polymers. 2 different types of imprinting can be done: Hot embossing and flash imprint. It is not possible to align the wafers one wishes to imprint (except by eye).