Specific Process Knowledge/Lithography/NanoImprintLithography: Difference between revisions
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'''Feedback to this section''': | '''Feedback to this section''': | ||
'''[mailto:labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/NanoImprintLithography# Imprinter 01 click here]''' | '''[mailto:labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/NanoImprintLithography# Imprinter 01 click here]''' | ||
[[File:polyetch1.jpg|400px]] | |||
The Imprinter 01 is a system for imprinting in polymers. 2 different types of imprinting can be done: Hot embossing and flash imprint. It is not possible to align the wafers one wishes to imprint (except by eye). | The Imprinter 01 is a system for imprinting in polymers. 2 different types of imprinting can be done: Hot embossing and flash imprint. It is not possible to align the wafers one wishes to imprint (except by eye). | ||
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==Overview of the performance of the Imprinter 01 and some process related parameters== | ==Overview of the performance of the Imprinter 01 and some process related parameters== | ||