Specific Process Knowledge/Characterization/XPS/XPS technique: Difference between revisions
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=XPS technique= | =XPS technique= | ||
XPS is a surface sensitive and non destructive technique used for analysis of the elemental composition of a sample. The basic principle is shown below (the image is taken from Wikipedia). | XPS is a surface sensitive and non destructive technique used for analysis of the elemental composition of a sample. It relies on the photoelectric effect; X-ray photons irradiated onto a sample will cause electrons bound in the sample atoms to become free electrons inside the the sample as | ||
The basic principle is shown below (the image is taken from Wikipedia). | |||
[[File:800px-XPS_PHYSICS.jpg|700px| frameless|link=https://en.wikipedia.org/wiki/X-ray_photoelectron_spectroscopy|XPS principle. Image taken from wikipedia - click on image to access wikipedia directly.]] | [[File:800px-XPS_PHYSICS.jpg|700px| frameless|link=https://en.wikipedia.org/wiki/X-ray_photoelectron_spectroscopy|XPS principle. Image taken from wikipedia - click on image to access wikipedia directly.]] | ||