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Specific Process Knowledge/Lithography/Coaters: Difference between revisions

Taran (talk | contribs)
Taran (talk | contribs)
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* PGMEA for spinner bowl cleaning and vapor tip bath
* PGMEA for spinner bowl cleaning and vapor tip bath
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* AR-P 6200.09 (CSAR)
* AZ5214E resist
* AZ5214E resist
* AZ MiR 701 (29cps)
* AZ4562 resist
* AZ4562 resist
* Acetone for chuck cleaning
* PGMEA solvent for edge bead removal, backside rinse, and spinner bowl cleaning
* Acetone for drip pan
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* No permanent media
* No permanent media
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* no
* no
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* 2 automatic syringes
* syringe dispense
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* yes
* yes
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*10 - 9990 rpm
*10 - 9990 rpm
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*100 - 5000 rpm
*10 - 6000 rpm
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*10 - 5000 rpm (3000 rpm with non-vacuum chuck)
*10 - 5000 rpm (3000 rpm with non-vacuum chuck)
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*no
*no
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*optional
*no
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*optional (max. speed 3000 rpm)
*optional (max. speed 3000 rpm)
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*1 - 25
*1 - 25
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*1 - 24
*1 - 25
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*1
*1
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*Glass
*Glass
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*All cleanroom materials except III-V materials
*Silicon
*III-V materials
*Glass
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*All cleanroom materials except III-V materials
*All cleanroom materials except III-V materials