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!Learning Objectives
!Learning Objectives
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* Describe fundamental parts of lithographic processing in a cleanroom, design of process flows
*Know why and when to use dry etching
* Authorization to use spin coater, mask aligner, and developer at DTU Danchip
*Use the dry etchers without harming the machines
* Calculate relevant process parameters
*Select the right instrument to use for his/her dry etch processing
* Analyze and apply your results of lithographic processing
*Select an appropriate etch recipe for his/her dry etch processing
*Spot when the recipe needs to be tuned for his/her needs and
*Suggest relevant tuning parameters
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