Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
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== The STAMP recipe == | == The STAMP recipe == | ||
The STAMP recipe uses the same total amount of FDTS as FLAT but delivers it much slower in order to obtain a much better and conformal coating of fine nanostructures. | === Purpose === | ||
The STAMP recipe uses the same total amount of FDTS as FLAT but delivers it much slower in order to obtain a much better and conformal coating of fine nanostructures. STAMP should always be used for stamps for nanoimprint lithography irregardless of the featuresize. | |||
=== Process description === | |||
A cycle with 1 injection of FDTS at 0.400 Torr + 1 injection of water at 6 Torr reacts for 15 minutes. Then the process chamber is evacuated and a new cycle starts until 4 cycles are completed. This gives a total process time of some 80 minutes. | |||
=== Process sequence === | |||
{| border="2" cellpadding="2" cellspacing="1" | {| border="2" cellpadding="2" cellspacing="1" | ||
|+'''The STAMP | |+'''The STAMP process sequence''' | ||
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! rowspan="3" colspan="2" align="center"| O<sub>2</sub> plasma | ! rowspan="3" colspan="2" align="center"| O<sub>2</sub> plasma | ||