Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
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|+'''The STAMP recipe''' | |+'''The STAMP recipe''' | ||
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|rowspan="3" align="center"| | |rowspan="3" align="center"| Initial RF clean | ||
! rowspan="3" align="center"| O<sub>2</sub> plasma | ! rowspan="3" align="center"| O<sub>2</sub> plasma | ||
! Flow | ! Flow | ||