Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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<gallery caption="Different places to do anisotropic wet silicon etch" widths="350px" heights="250px" perrow="3"> | <gallery caption="Different places to do anisotropic wet silicon etch" widths="350px" heights="250px" perrow="3"> | ||
image:KOH_BHF.JPG|Wetbench 01: Si etch, for Si etch of 4" and 6" wafers using KOH. Positioned in cleanroom D-3. | image:KOH_BHF.JPG|Wetbench 01: Si etch, for Si etch of 4" and 6" wafers using KOH. Positioned in cleanroom D-3. | ||
image:KOH_fumehood.JPG|Fume hood 06: Si etch, for | image:KOH_fumehood.JPG|Fume hood 06: Si etch, for Si etch of 4" and 6" wafers using KOH. Positioned in cleanroom D-3. This is used for wafers that are considered dirty.</gallery> | ||
'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | '''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | ||