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Specific Process Knowledge/Etch/KOH Etch: Difference between revisions

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<gallery caption="Different places to do anisotropic wet silicon etch" widths="350px" heights="250px" perrow="3">  
<gallery caption="Different places to do anisotropic wet silicon etch" widths="350px" heights="250px" perrow="3">  
image:KOH3_RR4_1.JPG|KOH3 bench for etch of 4" and 6" wafers. Positioned in cleanroom D-3.
image:KOH_BHF.JPG|KOH3 bench for etch of 4" and 6" wafers. Positioned in cleanroom D-3.  
image:KOH_4tommer.jpg|KOH etch for 4" wafers. KOH1 to the left and KOH2 to the right, in between you find the BHF tank. Positioned in cleanroom C-1.  
image:KOH_fumehood.JPG|KOH_fumehood is positioned in cleanroom A-1. This is used for wafers that are considered dirty.</gallery>
image:KOH_fumehood.JPG|KOH_fumehood is positioned in cleanroom A-1. This is used for wafers that are considered dirty.</gallery>


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