Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
| Line 142: | Line 142: | ||
<gallery caption="Different places to do wet silicon oxide etch" widths="220px" heights="225px" perrow="5"> image:BHF clean.JPG|BHF clean in D-3. Wet silicon oxide etch bath positioned to the right in the wetbench. This bath can also be used for BHF with wetting agent. | <gallery caption="Different places to do wet silicon oxide etch" widths="220px" heights="225px" perrow="5"> image:BHF clean.JPG|BHF clean in D-3. Wet silicon oxide etch bath positioned to the right in the wetbench. This bath can also be used for BHF with wetting agent. | ||
image: | image:KOH_BHF.JPG|BHF in wetbench1 Si etch - D-3 (Oxide etch 1: BHF.) The BHF bath is positioned in the middle of the bench. This is primarily used to remove oxide before and after a Si etch. | ||
image:BHF-PolySi-Al Etch.jpg|BHF etch in RCA bench in B-1. | image:BHF-PolySi-Al Etch.jpg|BHF etch in RCA bench in B-1. | ||
image:Stinkskab RR2.jpg|PP-bath: positioned in the upper right corner of the fumehood in cleanroom B-1. </gallery> | image:Stinkskab RR2.jpg|PP-bath: positioned in the upper right corner of the fumehood in cleanroom B-1. </gallery> | ||