Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
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*780-790 <sup>o</sup>C | *780-790 <sup>o</sup>C | ||
The temperature | The temperature vary over the furnace tube | ||
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|style="background:LightGrey; color:black"|Pressure | |style="background:LightGrey; color:black"|Pressure | ||