Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
| Line 47: | Line 47: | ||
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:WhiteSmoke; color:black"|<b> | |style="background:WhiteSmoke; color:black"|<b>6" LPCVD nitride furnace (B2)</b> | ||
|style="background:WhiteSmoke; color:black"|<b> | |style="background:WhiteSmoke; color:black"|<b>4" LPCVD nitride furnace (E3)</b> | ||
|- | |- | ||
!style="background:silver; color:black;" align="center"|Purpose | !style="background:silver; color:black;" align="center"|Purpose | ||