Jump to content

Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
Line 93: Line 93:




== The FLAT recipe ==
== The STAMP recipe ==


The FLAT recipe is designed for coating of non-structured wafers. The amount of FDTS is delivered in one cycle (4 injections pf FDTS at 0.400 Torr + 1 injection of water at 18 Torr) and the reaction time is 15 minutes.
The STAMP recipe uses the same total amount of FDTS as FLAT but delivers it much slower in order to obtain a much better and conformal coating of fine nanostructures. A cycle with 1 injection of FDTS at 0.400 Torr + 1 injection of water at 6 Torr reacts for 15 minutes. Then the process chamber is evacuated and a new cycle starts.
 
and the reaction time is 15 minutes.
{| border="2" cellpadding="2" cellspacing="1"  
{| border="2" cellpadding="2" cellspacing="1"  
|+'''The FLAT recipe'''
|+'''The STAMP recipe'''
|-
|-
! rowspan="3" align="center"| O<sub>2</sub> plasma
! rowspan="3" align="center"| O<sub>2</sub> plasma
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/MVD"