Specific Process Knowledge/Thin film deposition/ALD2 (PEALD): Difference between revisions
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|style="background:LightGrey; color:black"|Thermal ALD or PEALD deposition of | |style="background:LightGrey; color:black"|Thermal ALD or PEALD deposition of | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Al<sub>2</sub>O<sub>3</sub> | *Al<sub>2</sub>O<sub>3</sub> - mainly backup for ALD 1 | ||
*TiO<sub>2</sub> (amorphous or anatase) | *TiO<sub>2</sub> (amorphous or anatase) - mainly backup for ALD 1 | ||
*SiO<sub>2</sub> | *SiO<sub>2</sub> | ||
*HfO<sub>2</sub> | *HfO<sub>2</sub> | ||
*AlN | *AlN | ||
*TiN | *TiN | ||