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Specific Process Knowledge/Direct Structure Definition: Difference between revisions

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!Prerequisites
!Prerequisites
|Sample with resist.<br> A glass mask with desired pattern. For mask layout software see [[Specific Process Knowledge/Lithography/UVLithography/Mask Design| Mask design]]  
|Sample with resist.<br> A glass mask with desired pattern. For mask layout software see [[Specific Process Knowledge/Pattern Design| Mask design]]  
|Sample with polymer.<br> A stamp with the wanted pattern, usually in Si or SiO\rm{_2} however other materials could also be used.  
|Sample with polymer.<br> A stamp with the wanted pattern, usually in Si or SiO\rm{_2} however other materials could also be used.  
|A stamp/shim with the wanted pattern, usually in Ni or Al, cut out to fit in the injection moulding machine.
|A stamp/shim with the wanted pattern, usually in Ni or Al, cut out to fit in the injection moulding machine.