Specific Process Knowledge/Etch/RIE (Reactive Ion Etch): Difference between revisions
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In RIE2 it is allowed to have small amounts of metals exposed to the plasma. | In RIE2 it is allowed to have small amounts of metals exposed to the plasma. | ||
'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | '''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | ||