Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions

@@ Line 21: / Line 21: @@
 ; Substrate surface
-: A O<sub>2</sub> plasma is run prior to any process in order to
+: A O<sub>2</sub> plasma is run prior to any process in order to condition the substrate surface. This will also remove any existing MVD coating.
-condition the substrate surface. This will also remove any existing MVD coating.
 ; Water content