Specific Process Knowledge/Thin film deposition: Difference between revisions
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[[/Lesker|ITO (Tin doped Indium Oxide)]]<br/> | [[/Lesker|ITO (Tin doped Indium Oxide)]]<br/> | ||
[[/Deposition of AZO |AZO (Aluminum doped Zinc Oxide)]]<br/> | [[/Deposition of AZO |AZO (Aluminum doped Zinc Oxide)]]<br/> | ||
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Revision as of 12:43, 30 January 2017
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Choose material to deposit
Dielectrica | Semicondutors | Metals | Alloys | Transparent conductive oxides | Polymers |
Silicon Nitride - and oxynitride |
Aluminium |
TiW alloy (10%/90% by weight) |
ITO (Tin doped Indium Oxide) |
SU-8 |
Choose deposition equipment
PVD | LPCVD | PECVD | ALD | Coaters | Others
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See the Lithography/Coaters page for coating polymers |
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