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Specific Process Knowledge/Characterization/SEM Tabletop 1: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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|style="background:WhiteSmoke; color:black"|<b>SEM Tabletop 1 (Hitachi TM3030 Plus )</b>
|style="background:WhiteSmoke; color:black"|<b>SEM Tabletop 1 (Hitachi TM3030 Plus )</b>
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!style="background:silver; color:black"  rowspan="1"|Purpose
!style="background:silver; color:black"  align="center" valign="center"  rowspan="1"|Purpose
|style="background:LightGrey; color:black"|Imaging and measurement of
|style="background:LightGrey; color:black"|Imaging and measurement of
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
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* Thick polymers, glass or quartz samples
* Thick polymers, glass or quartz samples
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!style="background:silver; color:black;" width="60"|Location  
!style="background:silver; color:black;" align="center" valign="center"  width="60"|Location  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* Basement of DTU Danchip
* Basement of DTU Danchip
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!style="background:silver; color:black;"  width="60"|Performance
!style="background:silver; color:black;"  align="center" valign="center"  width="60"|Performance
|style="background:LightGrey; color:black"|Resolution
|style="background:LightGrey; color:black"|Resolution
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
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|style="background:LightGrey; color:black"|Detectors
|style="background:LightGrey; color:black"|Detectors
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* Secondary electron (Se2)
* Secondary electron (SE)
* Inlens secondary electron (Inlens)
* Backscatter electron (BSE)
* 4 Quadrant Backscatter electron (QBSD)
* Variable pressure secondary electron (VPSE)
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|style="background:LightGrey; color:black"|Stage
|style="background:LightGrey; color:black"|Stage
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* X, Y: 35 &times; 35 mm
* X, Y: 35 &times; 35 mm
* T: No tilt
* T: No tilt
* R: no rotation
* R: No rotation
* Z: 0 mm
* Z: 0 mm
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* Charge-up reduction vacuum mode: 50 Pa  
* Charge-up reduction vacuum mode: 50 Pa  
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!style="background:silver; color:black"  rowspan="3"|Substrates
!style="background:silver; color:black"  align="center" valign="center"  rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Sample size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Up to 6" wafer with full view
* Diameter: 70 mm
* Height: 50 mm
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| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
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