Specific Process Knowledge/Characterization/SEM Tabletop 1: Difference between revisions
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[[image:Tabletop SEM.jpg|400x400px|right|thumb|SEM Tabletop 1 located in basement 346-904]] | [[image:Tabletop SEM.jpg|400x400px|right|thumb|SEM Tabletop 1 located in basement 346-904]] | ||
=SEM | =SEM Tabletop 1= | ||
The SEM Tabletop 1 | The SEM Tabletop 1 is a scanning electron microscope. It produces enlarged images of a variety of specimens. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation. | ||
The SEM is very fast and easy to use. Sample loading can be done fast and easy. It is not needed to perform much optimization in order to obtain good SEM images. | The SEM is very fast and easy to use. Sample loading can be done fast and easy. It is not needed to perform much optimization in order to obtain good SEM images. | ||
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However, it has a limited resolution compared to the other SEMs at Danchip, but for inspection of samples with structures in the micrometer range it is very fast and easy to use. | However, it has a limited resolution compared to the other SEMs at Danchip, but for inspection of samples with structures in the micrometer range it is very fast and easy to use. | ||
Many sample materials are allowed in the this SEM, including all standard cleanroom materials and some biological samples | Many sample materials are allowed in the this SEM, including all standard cleanroom materials and some biological samples, if they have been approved by Danchip. | ||
The stage can be moved manually in the X and Y directions by turning two knobs in the | The stage can be moved manually in the X and Y directions by turning two knobs in the | ||
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:WhiteSmoke; color:black"|<b>SEM | |style="background:WhiteSmoke; color:black"|<b>SEM Tabletop 1 (Hitachi TM3030 Plus )</b> | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Purpose | !style="background:silver; color:black" align="center" valign="center" rowspan="1"|Purpose | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Basement of DTU Danchip | * Basement of DTU Danchip | ||
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!style="background:silver; color:black;" align="center" width="60"|Performance | !style="background:silver; color:black;" align="center" width="60"|Performance | ||
|style="background:LightGrey; color:black"|Resolution | |style="background:LightGrey; color:black"|Resolution | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | * ~25 nm | ||
The resolution is strongly dependent on the type of sample and the skills of the operator. | The resolution is strongly dependent on the type of sample and the skills of the operator. | ||
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|style="background:LightGrey; color:black"|Detectors | |style="background:LightGrey; color:black"|Detectors | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Secondary electron (Se2) | * Secondary electron (Se2) | ||
*Inlens secondary electron (Inlens) | * Inlens secondary electron (Inlens) | ||
*4 Quadrant Backscatter electron (QBSD) | * 4 Quadrant Backscatter electron (QBSD) | ||
*Variable pressure secondary electron (VPSE) | * Variable pressure secondary electron (VPSE) | ||
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|style="background:LightGrey; color:black"|Stage | |style="background:LightGrey; color:black"|Stage | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*X, Y: | * X, Y: 35 × 35 mm | ||
*T: | * T: No tilt | ||
*R: | * R: no rotation | ||
*Z: | * Z: 0 mm | ||
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|style="background:LightGrey; color:black"|Electron source | |style="background:LightGrey; color:black"|Electron source | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | * Thermionic tungsten filament | ||
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|style="background:LightGrey; color:black"|Operating pressures | |style="background:LightGrey; color:black"|Operating pressures | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | * Conductor vacuum mode: 5 Pa | ||
* | * Standard vacuum mode: 30 Pa | ||
* Charge-up reduction vacuum mode: 50 Pa | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool | * Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool | ||
* Some biological samples (ask for permission) | |||
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