Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions

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 [[image:Mvd.jpg|200x200px|right|thumb|The MVD is located in cleanroom 1]]
-The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
+The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. At Danchip the MVD is essential for nanoimprint lithography.
+== Processing on the MVD ==
+The MVD coatings are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. These chemicals typically have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si(Cl<sub>x</sub>)<sub>3-x</sub>.
+In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
 <gallery caption="Some chemicals of the MVD and the surface reaction" widths="200px" heights="150px" perrow="2">