Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
| Line 163: | Line 163: | ||
* R: 360<sup>o</sup> | * R: 360<sup>o</sup> | ||
* Z: 50 mm | * Z: 50 mm | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* X, Y: 35 mm | |||
* T: 0<sup>o</sup> | |||
* R: 360<sup>o</sup> | |||
* Z: 0 mm | |||
|- | |- | ||
|style="background:LightGrey; color:black" align="center" |Electron source | |style="background:LightGrey; color:black" align="center" |Electron source | ||
| Line 218: | Line 218: | ||
* Up to 6" wafer with full view | * Up to 6" wafer with full view | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Up to 70 mm with full wiew | |||
<!--|style="background:WhiteSmoke; color:black"| | <!--|style="background:WhiteSmoke; color:black"| | ||
* Wafers won´t fit without a proper holder. The height of the sample is critical, should be as small, as possible--> | * Wafers won´t fit without a proper holder. The height of the sample is critical, should be as small, as possible--> | ||