Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
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The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL. | The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL. | ||
<gallery caption="Some chemicals of the MVD and the surface reaction" heights="300px" perrow="2"> | |||
image:chlorosilanes.jpg| Different chemicals for the MVD. | |||
image:MVDsurfacereaction.jpg|The chemical reaction in which the Cl atoms of the precursors are eliminated under formation of HCl. | |||
</gallery> | |||
{| border="2" cellpadding="2" cellspacing="1" | {| border="2" cellpadding="2" cellspacing="1" | ||
Revision as of 20:34, 2 April 2008
The Molecular Vapor Deposition Tool
The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
- Some chemicals of the MVD and the surface reaction
-
Different chemicals for the MVD. -
The chemical reaction in which the Cl atoms of the precursors are eliminated under formation of HCl.
| O2 plasma | Flow | 200 sccm |
|---|---|---|
| Power | 250 Watts | |
| Time | 300 seconds | |
| Chemical # 1 (vapor order 1) | Name | FDTS |
| Line no. | 3 | |
| Cycles | 4 | |
| Pressure | 0.500 Torr | |
| Chemical # 2 (vapor order 2) | Name | Water |
| Line no. | 1 | |
| Cycles | 1 | |
| Pressure | 18 Torr | |
| Processing | Time | 900 seconds |
| Purge | Cycles | 5 |