Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
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The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL. | The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL. | ||
{| border="2" cellpadding="2" cellspacing="1" | {| border="2" cellpadding="2" cellspacing="1" | ||
Line 25: | Line 18: | ||
| 300 seconds | | 300 seconds | ||
|- | |- | ||
! rowspan="4" align="center"| Chemical # 1 (vapor order 1) | |||
! rowspan=" | ! Name | ||
| FDTS | |||
|- | |||
! Line no. | |||
| 3 | |||
|- | |||
! Cycles | |||
| 4 | |||
|- | |||
! Pressure | |||
| 0.500 Torr | |||
|- | |||
! rowspan="3" align="center"| Chemical # 2 (vapor order 2) | ! rowspan="3" align="center"| Chemical # 2 (vapor order 2) | ||
! Name | |||
| Water | |||
|- | |||
! Line no. | |||
| 1 | |||
|- | |||
! Cycles | |||
| 1 | |||
|- | |||
! Pressure | |||
| 18 Torr | |||
|- | |||
! Processing | ! Processing | ||
! Time | |||
| 900 seconds | |||
|- | |- | ||
! Temperature | ! Temperature |
Revision as of 16:44, 2 April 2008
The Molecular Vapor Deposition Tool
The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
O2 plasma | Flow | 200 sccm | ||
---|---|---|---|---|
Power | 250 Watts | |||
Time | 300 seconds | |||
Chemical # 1 (vapor order 1) | Name | FDTS | ||
Line no. | 3 | |||
Cycles | 4 | |||
Pressure | 0.500 Torr | |||
Chemical # 2 (vapor order 2) | Name | Water | ||
Line no. | 1 | |||
Cycles | 1 | |||
Pressure | 18 Torr | |||
Processing | Time | 900 seconds | ||
Temperature | 10oC | SF6 Flow | 260 sccm | 0 sccm |
No. of cycles | 31 | O2 Flow | 26 sccm | 0 sccm |