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Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions

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The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.


{| border="2" cellpadding="2" cellspacing="1"  
{| border="2" cellpadding="2" cellspacing="1"  
Line 25: Line 18:
| 300 seconds
| 300 seconds
|-
|-
 
! rowspan="4" align="center"| Chemical # 1 (vapor order 1)
! rowspan="3" align="center"| Chemical # 1 (vapor order 1)
! Name
| FDTS
|-
! Line no.
| 3
|-
! Cycles
| 4
|-
! Pressure
| 0.500 Torr
|-
! rowspan="3" align="center"| Chemical # 2 (vapor order 2)
! rowspan="3" align="center"| Chemical # 2 (vapor order 2)
! Name
| Water
|-
! Line no.
| 1
|-
! Cycles
| 1
|-
! Pressure
| 18 Torr
|-
! Processing  
! Processing  
! Time
| 900 seconds
|-
|-
! Temperature  
! Temperature  
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