Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD-3: Difference between revisions

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Revision as of 13:28, 17 January 2017

Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
8/1-2015 4" Wafer with travkaXX mask AZ standard Si / XX % Pegasus/jmli 10 minute TDESC clean danchip/jml/showerhead/prD/PrD-3, 150 cyc or 8:48 mins S004781 New showerhead