Specific Process Knowledge/Thin film deposition/MVD: Difference between revisions
| Line 17: | Line 17: | ||
! rowspan="3" align="center"| O<sub>2</sub> plasma | ! rowspan="3" align="center"| O<sub>2</sub> plasma | ||
! Flow | ! Flow | ||
| 200 sccm | |||
|- | |||
! Power | ! Power | ||
| 250 Watts | |||
|- | |||
! Time | ! Time | ||
| 300 seconds | | 300 seconds | ||
|- | |- | ||
Revision as of 16:29, 2 April 2008
The Molecular Vapor Deposition Tool
The Applied Microstructures MVD 100 system deposits molecular films on surfaces. These films serve a wide range of purposes ranging from antistiction coatings of nanoimprint lithography stamps to protecting MEMS structures. They are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. In most cases the chlorine atoms in the end of an flourinated organosilane react with -OH groups of the surface to form a chemical bond under elimination of HCL.
| O2 plasma | Flow | 200 sccm | ||
|---|---|---|---|---|
| Power | 250 Watts | |||
| Time | 300 seconds | |||
| Chemical # 1 (vapor order 1) | Chemical # 2 (vapor order 2) | Processing | ||
| Temperature | 10oC | SF6 Flow | 260 sccm | 0 sccm |
| No. of cycles | 31 | O2 Flow | 26 sccm | 0 sccm |