Specific Process Knowledge/Thin film deposition/ALD2 (PEALD): Difference between revisions
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Different precursor lines are connected to the reactor chamber through separate precursor inlets. At the moment the available precursors are TMA, TiCl<sub>4</sub>, SAM24, TEMAHf, H<sub>2</sub>O and NH<sub>3</sub>, and soon O<sub>3</sub> will also be available. These precursor lines are all purged with a constant flow of nitrogen. | Different precursor lines are connected to the reactor chamber through separate precursor inlets. At the moment the available precursors are TMA, TiCl<sub>4</sub>, SAM24, TEMAHf, H<sub>2</sub>O and NH<sub>3</sub>, and soon O<sub>3</sub> will also be available. These precursor lines are all purged with a constant flow of nitrogen. | ||
The liquid precursor sources TMA, TiCl<sub>4</sub> and H<sub>2</sub>O are stored in bottles located in a side cabinet on the left side of the machine. When the TMA and TiCl<sub>4</sub> precursors are not in use, the manual valves have to be closed. The powder precursors SAM24 and TEMAHf are stored in bottles located in a big cabinet below the ALD chamber. These precursors are heated by heating jackets, and users should not open and close the manual valves. | The liquid precursor sources TMA, TiCl<sub>4</sub> and H<sub>2</sub>O are stored in bottles located in a side cabinet on the left side of the machine. When the TMA and TiCl<sub>4</sub> precursors are not in use, the manual valves have to be closed. The powder precursors SAM24 and TEMAHf are stored in bottles located in a big cabinet below the ALD chamber. These precursors are heated by heating jackets, and users should not open and close the manual valves. O<sub>3</sub> is generated by use of an ozone generator that is located in the E-rack at the right side of the machine. | ||
A remote plasma generator is connected to the upper part of the reactor chamber. Different precursor gases are connected to this plasma generator through the same gas inlet. At the moment the available plasma precursor gases are N<sub>2</sub>, O<sub>2</sub> and NH<sub>3</sub>, and soon H<sub>2</sub>/N<sub>2</sub> will also be available. The plasma gas inlet is constantly purged with argon. The plasma gasses can also be used as precursors for thermal ALD if the power to the plasma generator is not turned on. | A remote plasma generator is connected to the upper part of the reactor chamber. Different precursor gases are connected to this plasma generator through the same gas inlet. At the moment the available plasma precursor gases are N<sub>2</sub>, O<sub>2</sub> and NH<sub>3</sub>, and soon H<sub>2</sub>/N<sub>2</sub> will also be available. The plasma gas inlet is constantly purged with argon. The plasma gasses can also be used as precursors for thermal ALD if the power to the plasma generator is not turned on. | ||