Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
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|Selectivity to resist [:1] | |Selectivity to resist [:1] | ||
| (SiO2:resist) | | 4-5:1 (SiO2:resist) | ||
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Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits |
Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits |
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| Line 133: | Line 133: | ||
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|Selectivity to resist [:1] | |Selectivity to resist [:1] | ||
| (SiO2:resist) | | 4-5:1 (SiO2:resist) | ||
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