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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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|Etch rate of thermal oxide
|Etch rate of thermal oxide
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|'''145-172 nm/min''' ''by bghe@danchip (2015-06-11)''
|'''145 nm/min ''' ''by Martin Lind Ommen (fall 2016)''
|'''145 nm/min ''' ''by Martin Lind Ommen (fall 2016)''
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|-
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