Specific Process Knowledge/Thin film deposition/Deposition of NiV: Difference between revisions

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Nickel Vanadium may be sputter deposited in either Sputter-system (Lesker) or Wordentec

In the chart below you can compare the different deposition equipment.

	Sputter deposition (Sputter-System Lesker)	Sputter deposition (Wordentec)
General description	Sputter deposition of NiV	Sputter deposition of NiV
Pre-clean	RF Ar clean	RF Ar clean
Layer thickness	About 10Å to 5000Å
Deposition rate	Depending on process parameters.	Depending on process parameters.
Batch size	Pieces or 1x4" wafer or 1x6" wafer	24x2" wafers or 6x4" wafers or 6x6" wafers
Allowed substrates	Silicon wafers Quartz wafers Pyrex wafers(No substrate heating)	Silicon wafers Quartz wafers Pyrex wafers
Allowed materials	Silicon Silicon oxide Silicon nitride Silicon (oxy)nitride Photoresist PMMA Mylar SU-8 Metals Carbon	Silicon Silicon oxide Silicon nitride Silicon (oxy)nitride Photoresist PMMA Mylar SU-8 Metals Carbon
Comment	Sputter target with NiV composition: Ni/V 93/7%	Sputter target with NiV composition: Ni/V 93/7%

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 * Carbon
 |
+* Silicon
 * Silicon oxide
+* Silicon nitride
 * Silicon (oxy)nitride
 * Photoresist
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 * SU-8
 * Metals
+* Carbon
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 ! Comment