Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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*5%B<sub>2</sub>H<sub>6</sub>:0-1000 sccm | *5%B<sub>2</sub>H<sub>6</sub>:0-1000 sccm | ||
| | | | ||
*SiH<sub>4</sub>:0- | *SiH<sub>4</sub>:0-60 sccm | ||
*N<sub>2</sub>O:0- | *N<sub>2</sub>O:0-3000 sccm | ||
*NH<sub>3</sub>:0- | *NH<sub>3</sub>:0-400 sccm | ||
*N<sub>2</sub>:0- | *N<sub>2</sub>:0-3000 sccm | ||
*Ar:0-1000 sccm | |||
*He: 200sccm | |||
*5%PH<sub>3</sub>:0-? sccm | *5%PH<sub>3</sub>:0-? sccm | ||
*5%B<sub>2</sub>H<sub>6</sub>:0-? sccm | *5%B<sub>2</sub>H<sub>6</sub>:0-? sccm | ||