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Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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*In-line substrate HMDS priming
*In-line substrate HMDS priming
*Coating and baking of  
*Coating and baking of  
**AZ MiR 701 (29cps) resist
**AZ MiR 701 (29cps)
**AZ nLOF 2020 resist
**AZ nLOF 2020
**AZ 5214E
**AZ 5214E
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*In-line substrate HMDS priming
*In-line substrate HMDS priming
*Coating and baking of  
*Coating and baking of  
**AZ MiR 701 (29cps) resist
**AZ MiR 701 (29cps)
**AZ nLOF 2020 resist
**AZ nLOF 2020
*Post-exposure baking at 110°C
*Post-exposure baking at 110°C
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Coating and baking of
*Coating and baking of
**AZ5214E resist
**AZ5214E
**AZ4562 resist
**AZ4562
**E-beam resist (for batches > 25 wafers)
**E-beam resist (for batches > 25 wafers)
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Coating of
*Coating of
**SU-8 resist
**SU-8
**AZ 5214E resist
**AZ 5214E
**AZ 4562 resist
**AZ 4562
**AZ MiR resist
**AZ MiR
**AZ nLOF resist
**AZ nLOF
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Coating of all resists
*Coating of all resists
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** PMMA/MMA
** PMMA/MMA
** HSQ (FOx)
** HSQ (FOx)
**AZ 5214E resist
**AZ 5214E
**AZ 4562 resist
**AZ 4562
**AZ MiR resist
**AZ MiR
**AZ nLOF resist
**AZ nLOF
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Coating of
*Coating of
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** PMMA/MMA
** PMMA/MMA
** HSQ (FOx)
** HSQ (FOx)
**AZ 5214E resist
**AZ 5214E
**AZ 4562 resist
**AZ 4562
**AZ MiR resist
**AZ MiR
**AZ nLOF resist
**AZ nLOF
** ESPACER
** ESPACER
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|