Specific Process Knowledge/Lithography/Coaters: Difference between revisions
Appearance
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*In-line substrate HMDS priming | *In-line substrate HMDS priming | ||
*Coating and baking of | *Coating and baking of | ||
**AZ MiR 701 (29cps) | **AZ MiR 701 (29cps) | ||
**AZ nLOF 2020 | **AZ nLOF 2020 | ||
**AZ 5214E | **AZ 5214E | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*In-line substrate HMDS priming | *In-line substrate HMDS priming | ||
*Coating and baking of | *Coating and baking of | ||
**AZ MiR 701 (29cps) | **AZ MiR 701 (29cps) | ||
**AZ nLOF 2020 | **AZ nLOF 2020 | ||
*Post-exposure baking at 110°C | *Post-exposure baking at 110°C | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Coating and baking of | *Coating and baking of | ||
**AZ5214E | **AZ5214E | ||
**AZ4562 | **AZ4562 | ||
**E-beam resist (for batches > 25 wafers) | **E-beam resist (for batches > 25 wafers) | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Coating of | *Coating of | ||
**SU-8 | **SU-8 | ||
**AZ 5214E | **AZ 5214E | ||
**AZ 4562 | **AZ 4562 | ||
**AZ MiR | **AZ MiR | ||
**AZ nLOF | **AZ nLOF | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Coating of all resists | *Coating of all resists | ||
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** PMMA/MMA | ** PMMA/MMA | ||
** HSQ (FOx) | ** HSQ (FOx) | ||
**AZ 5214E | **AZ 5214E | ||
**AZ 4562 | **AZ 4562 | ||
**AZ MiR | **AZ MiR | ||
**AZ nLOF | **AZ nLOF | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Coating of | *Coating of | ||
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** PMMA/MMA | ** PMMA/MMA | ||
** HSQ (FOx) | ** HSQ (FOx) | ||
**AZ 5214E | **AZ 5214E | ||
**AZ 4562 | **AZ 4562 | ||
**AZ MiR | **AZ MiR | ||
**AZ nLOF | **AZ nLOF | ||
** ESPACER | ** ESPACER | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||