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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 89: Line 89:


*''' (0402) DCH 100mm HMDS Fast'''
*''' (0402) DCH 100mm HMDS Fast'''
*''' (0602) DCH 100mm HMDS Fast'''
*''' (0602) DCH 150mm HMDS Fast'''
VPO temperature: 120°C <br>
VPO temperature: 120°C <br>
Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 15s reaction @ ambient, 20s cooling @ 21°C.
Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 15s reaction @ ambient, 20s cooling @ 21°C.
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