Jump to content

Specific Process Knowledge/Etch/III-V ICP/SiO2: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
No edit summary
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
No edit summary
Line 30: Line 30:
|-style="background:Black; color:White"
|-style="background:Black; color:White"
!Results  
!Results  
!Test by Artem Shikin @ Fotonik
!SiO2 Etch Slow ''Test by Artem Shikin @ Fotonik''
|-
|-
|Etch rate of PECVD BPSG
|Etch rate of PECVD BPSG
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP/SiO2"